Nickel evaporation masks for use in selective vacuum chamber deposition processes, such as gold and silver plating on silicon, have been developed by Tecan. The masks are being far more durable and accurate as traditional ones. Using electroformin, techniques, tightly costed sheet masks are outperforming traditional photo-etched molybdenum which has limits on how small or defined, apertures may be. The method allows far tighter tolerances,so that greater density designs with higher accuracy aperture edges are produced. So ro-bust is the mask, that it will withstand the post-deposition cleaning process for up to ten times longer than other masks. Evaporation mask techniques are used to fabricate a wide number of simple and com-plex micro-engineered electro-nic components and products, for single and multi-layer applications.
EPP 194
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